The vacuum furnaces that the semiconductor industry needs to purchase are highly demanding, as they play a vital role in the semiconductor production process. Vacuum furnaces are mainly used for heat treatment and annealing of semiconductor materials, processes that require tight temperature control and a high degree of vacuum. According to different needs, the semiconductor industry needs to purchase the following different types of vacuum furnaces:

1. Plasma Enhanced Chemical Vapor Deposition (PECVD) Vacuum Furnaces: These vacuum furnaces are mainly used for depositing different types of thin films on the surface of semiconductor materials. High quality deposited films can be achieved at low temperatures by activating the gas-phase chemical reaction through plasma. In the semiconductor industry, PECVD vacuum furnace is widely used for the preparation of silicon dioxide (SiO2), silicon nitride (Si3N4) and other thin films.

2. Electron beam evaporation vacuum furnace: this vacuum furnace is mainly used in the semiconductor material surface evaporation of metals, oxides and other thin films, through the electron beam heating the material, will be evaporated to the substrate to form the desired film. Electron beam evaporation vacuum furnace has high temperature control precision and high vacuum degree, suitable for the growth of monocrystalline silicon, aluminum, alumina and other materials such as thin films.

3. Vacuum sintering furnace: This vacuum furnace is mainly used for heat treatment, annealing, sintering and other processes of semiconductor materials at high temperatures, in order to improve the material's crystallization quality, electrical properties and so on. Vacuum sintering furnace has a rapid temperature rise, high vacuum, uniform heating and other advantages, applicable to the heat treatment process of semiconductor materials.

4. Atmosphere treatment vacuum furnace: this vacuum furnace in the process can be added through the addition of nitrogen, oxygen and other gases, to achieve different atmospheres under the treatment, such as oxidation, reduction, nitriding and so on. Atmosphere treatment vacuum furnace in the semiconductor industry is widely used in polysilicon growth, silicon dioxide ablation of metal and other processes.

In general, the semiconductor industry needs to buy a vacuum furnace should have a high degree of automation, good stability, high precision temperature control, high vacuum, etc., in order to meet the stringent requirements of the semiconductor manufacturing process. In the choice of vacuum furnace, in addition to considering the technical parameters, should also take into account the production scale, process requirements, cost budget and other factors, choose the vacuum furnace models and configurations suitable for their needs. Therefore, the semiconductor industry in the purchase of vacuum furnaces need to carefully consider a variety of factors, choose the right equipment to improve production efficiency and product quality.